SMIC does have chipmaking tools that could conceivably be used to create 5nm processors. The ASML Twinscan NXT:2000i features a ≤38nm resolution, which is good enough for 7nm-class mass production using double-patterning lithography techniques. However, a finer resolution is required for 5nm-class process technologies. Chipmakers can use triple or even quadruple patterning to produce it. This lithographic technique involves splitting a complex pattern into several simpler patterns, which are then printed sequentially to achieve higher precision and detAIl. Multi-patterning is a tricky process that affects yields and the number of chiPS per wafer that can be used, so typically, it has been limited due to its impact on chip costs.
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